• Home Systems & Design Low Power - High Performance Manufacturing, Packaging & Materials Test, Measurement & Analytics Auto, Security & Enabling Technologies Special Reports Business & Startups Jobs Knowledge Center Technical PapersHome’;AI/ML/DLArchitecturesAutomotive/ AerospaceCommunication/Data MovementDesign & VerificationLithographyManufacturingMaterialsMemoryOptoelectronics / PhotonicsPackagingPower & PerformanceQuantumSecurityTest, Measurement, Analytics tech papersTransistorsZ-End Applications Home AI/ML/DL Architectures Automotive/ Aerospace Communication/Data Movement Design & Verification Lithography Manufacturing Materials Memory Optoelectronics / Photonics Packaging Power & Performance Quantum Security Test, Measurement, Analytics tech papers Transistors Z-End Applications Events & WebinarsEventsWebinars Events Webinars Videos & ResearchVideosIndustry Research Videos Industry Research Newsletters & StoreNewslettersStore Newsletters Store MENUHomeSpecial ReportsSystems & DesignLow Power-High PerformanceManufacturing, Packaging & MaterialsTest, Measurement & AnalyticsAuto, Security & Enabling TechnologiesKnowledge CenterVideosStartup CornerBusiness & StartupsJobsTechnical PapersEventsWebinarsIndustry ResearchNewslettersStoreSpecial Reports Home Special Reports Systems & Design Low Power-High Performance Manufacturing, Packaging & Materials Test, Measurement & Analytics Auto, Security & Enabling Technologies Knowledge Center Videos Startup Corner Business & Startups Jobs Technical Papers Events Webinars Industry Research Newsletters Store Special Reports Three New ALD/MLD Processes for Co-organic Thin Films (Aalto University, RUB et al.) A new technical paper, “Amido-Amine Co(II) Precursor-Based Atomic/Molecular Layer Deposition Processes for Cobalt-Organic Thin Films and Their Thermal Conversion to CoO Thin Films,” was published by researchers at Aalto University, Ruhr University Bochum, Tyndall National Institute, ESRF et al. • “Atomic/molecular layer depos

Article Summaries:

  • Aalto University, Ruhr University Bochum, and collaborators have reported the first atomic/molecular‑layer deposition (ALD/MLD) processes using an all‑nitrogen‑coordinated cobalt complex, Co(tmsaedma)₂, as the metal precursor. Three organic linkers-hydroquinone (HQ), 1,4‑benzenedithiol (BDT), and terephthalic acid (BDC)-were employed to grow Co(II)‑organic thin films (Co‑HQ, Co‑BDT, Co‑BDC). Comprehensive X‑ray, spectroscopic, and density‑functional‑theory studies revealed stability trends (BDC > HQ > BDT) and decomposition pathways for Co‑HQ and Co‑BDT. Calcination of Co‑BDC in N₂ produced low‑density, porous CoO films with tunable structure and optical properties, demonstrating a new route to transition‑metal thin films via ALD/MLD.

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